这篇研究系统探讨了HfO2在碳纳米管（CNT）上的原子层沉积（ALD）工艺，通过验证200°C自限制反应窗口（TDMAH/H2O体系），对比了 ...

为应对先进半导体节点中栅极漏电流激增的挑战，台湾研究人员创新性提出原子层氢调控（ALHM）技术，通过H2等离子体在ALD ...

BILTHOVEN, THE NETHERLANDS, December 11, 2008 – Further extending its leadership in the critical atomic layer deposition (ALD) market, ASM International N.V. (NASDAQ: ASMI and Euronext Amsterdam: ASM) ...

Material development for semiconductor and thin film materials requires a full understanding of the material characteristics and how they impact each other. The Thermo Scientific™ Nexsa™ XPS System ...

The Nature Index 2025 Research Leaders — previously known as Annual Tables — reveal the leading institutions and countries/territories in the natural and health sciences, according to their output in ...

The Nature Index 2024 Research Leaders — previously known as Annual Tables — reveal the leading institutions and countries/territories in the natural and health sciences, according to their output in ...