Ultra-fast correlative chemical-mechanical-polishing (CMP) metrology: integrating phase shifting interferometry with active-probe scanning probe microscopy
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Ultra-fast correlative chemical-mechanical-polishing (CMP) metrology: integrating phase shifting interferometry with active-probe scanning probe microscopy
This paper presents the development of an Ultra-Fast Correlative Metrology method that integrates high-accuracy phase-shifting interferometry (PSI) with active probe-atomic force microscopy (AP-AFM). PSI is a widely used optical metrology technique for precise surface roughness measurements, refractive index mapping, and other optical parameter ...
10 months ago
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